STRUCTURAL ORIGIN OF THE 5.16-EV OPTICAL-ABSORPTION BAND IN SILICA AND GE-DOPED SILICA

Citation
Te. Tsai et al., STRUCTURAL ORIGIN OF THE 5.16-EV OPTICAL-ABSORPTION BAND IN SILICA AND GE-DOPED SILICA, Applied physics letters, 64(12), 1994, pp. 1481-1483
Citations number
21
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
64
Issue
12
Year of publication
1994
Pages
1481 - 1483
Database
ISI
SICI code
0003-6951(1994)64:12<1481:SOOT5O>2.0.ZU;2-K
Abstract
The origin of the 5.16 eV absorption band observed in silica and Ge-do ped silica was studied using optical and electron spin resonance (ESR) measurements. The band was observed only in samples containing Ge, su ggesting that it is related to the Ge impurity in silica, while a lack of correlation between the ESR intensity of the induced hydrogen-asso ciated doublet and the absorption coefficient of the 5.16 eV band indi cates that it is not related to two-coordinated Si or Ge. The observat ion of the absorption coefficient increased as the square root of the Ge concentration demonstrates that the 5.16 eV band is not related to two-coordinated Ge defects but that it is an oxygen deficiency center of the divacancy type associated with Ge.