GAINP GAAS DOUBLE-HETEROJUNCTION BIPOLAR-TRANSISTOR WITH HIGH F(T), F(MAX), AND BREAKDOWN VOLTAGE/

Citation
Ji. Song et al., GAINP GAAS DOUBLE-HETEROJUNCTION BIPOLAR-TRANSISTOR WITH HIGH F(T), F(MAX), AND BREAKDOWN VOLTAGE/, IEEE electron device letters, 15(1), 1994, pp. 10-12
Citations number
13
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
07413106
Volume
15
Issue
1
Year of publication
1994
Pages
10 - 12
Database
ISI
SICI code
0741-3106(1994)15:1<10:GGDBWH>2.0.ZU;2-K
Abstract
We report on the dc and microwave performance of an MOCVD-grown carbon -doped GaInP/GaAs double heterojunction bipolar transistor (DHBT) with a thin highly doped n-type GaInP layer in the collector. The DHBT sho wed improved current-voltage characteristics at low collector-emitter bias compared with those of a DHBT without the heavily doped GaInP lay er, while maintaining a high breakdown voltage (BV(CEO) approximately 20 V). Small area, self-aligned emitter transistors with two 2 x 5 mum 2 emitter fingers were fabricated and exhibited f(T) and f(max) of 53 GHz and 75 GHz, respectively. These results indicate the promise of ca rbon-doped base GaInP/CaAs DHBT's for high-power microwave application s.