Bl. Tumanskii et al., ESR STUDY OF FREE-RADICALS FORMED UPON UV IRRADIATION OF NITROPENTAFLUOROACETONE IN VARIOUS SOLVENTS, Russian chemical bulletin, 42(3), 1993, pp. 466-488
The formation of CF3C(O)CF2N(O.)O2CF2C(O)CF3 free radicals upon the UV
irradiation of nitropentafluoroacetone (1) in toluene and mesitylene
is established by ESR. The most likely cause of their formation is the
one-electron oxidation of the solvents by photoexcited 1 followed by
decay of the radical anion formed from 1 with the expulsion of an NO2
anion and attachment of the radical to a molecule of original 1. The i
rradiation of 1 in triethylsilane results in the elimination of a fluo
ride ion and fixation of a CF3COCFN(O-)O. radical. UV irradiation of k
etone 1 in pentane results in the abstraction of a hydrogen atom from
the solvent and the formation of a CF3COCF2N(OH)O. radical.