ESR STUDY OF FREE-RADICALS FORMED UPON UV IRRADIATION OF NITROPENTAFLUOROACETONE IN VARIOUS SOLVENTS

Citation
Bl. Tumanskii et al., ESR STUDY OF FREE-RADICALS FORMED UPON UV IRRADIATION OF NITROPENTAFLUOROACETONE IN VARIOUS SOLVENTS, Russian chemical bulletin, 42(3), 1993, pp. 466-488
Citations number
13
Categorie Soggetti
Chemistry
Journal title
ISSN journal
10665285
Volume
42
Issue
3
Year of publication
1993
Pages
466 - 488
Database
ISI
SICI code
1066-5285(1993)42:3<466:ESOFFU>2.0.ZU;2-1
Abstract
The formation of CF3C(O)CF2N(O.)O2CF2C(O)CF3 free radicals upon the UV irradiation of nitropentafluoroacetone (1) in toluene and mesitylene is established by ESR. The most likely cause of their formation is the one-electron oxidation of the solvents by photoexcited 1 followed by decay of the radical anion formed from 1 with the expulsion of an NO2 anion and attachment of the radical to a molecule of original 1. The i rradiation of 1 in triethylsilane results in the elimination of a fluo ride ion and fixation of a CF3COCFN(O-)O. radical. UV irradiation of k etone 1 in pentane results in the abstraction of a hydrogen atom from the solvent and the formation of a CF3COCF2N(OH)O. radical.