C. Nedez et al., SURFACE ORGANOMETALLIC CHEMISTRY OF TIN - THERMAL TRANSFORMATION, UNDER VACUUM, OF SI-O-SN(N-BU)(3) SUPPORTED ON SILICA, Journal of the American Chemical Society, 116(7), 1994, pp. 3039-3046
The reactivity of the well-defined surface organometallic fragment dro
p Si-O-Sn(n-C4H9)(3) 1 grafted on silica(200) and on silica(500) has b
een studied by thermal treatment of 1 at increasing temperatures in va
cuo. The surface reactions have been followed by quantitative measurem
ents of the evolved gases, infrared and Mossbauer spectroscopies, C-13
CP-MAS and Sn-119 NMR spectroscopy, XPS measurements, and electron mi
croscopy (CTEM and STEM EDAX). On both types of silicas, the surface r
eactions are similar in nature, although differences are noticeable. F
irst, there is formation of (drop Si-O)(2)(Sn(n-C4H9)(2)) 2, which und
ergoes a second solvolysis process by silanols leading to (drop Si-O)(
3)Sn(n-C4H9) 3 and finally surface Sn(II) and Sn(IV) atoms (as determi
ned by XPS and Mossbauer experiments). Although the well-defined surfa
ce organometallic compound (drop Si-O)(2)Sn(n-C4H9)(2) can be prepared
on silica by another route, no unique surface compound can be obtaine
d during the thermal decomposition which transforms progressively 1 in
to 2 and 3. A mechanism of decomposition of the various surface organo
metallic complexes has been deduced from a comparison of the results o
btained on both solids. The alkyl groups seem to follow a beta-H elimi
nation mechanism leading to tin hydrides and 1-butene rather than a di
sproportionation mechanism leading to equimolar amounts of 1-butene an
d butane.