OXIDATION OF VANADIUM IN ATOMIC AND MOLECULAR-OXYGEN AT LOW-PRESSURES

Authors
RASPOPOV SA GUSAKOV AG VOROPAYEV AG VECHER AA
Citation
Sa. Raspopov et al., OXIDATION OF VANADIUM IN ATOMIC AND MOLECULAR-OXYGEN AT LOW-PRESSURES, Journal of alloys and compounds, 205(1-2), 1994, pp. 59-62
Citations number
4
Categorie Soggetti
Chemistry Physical","Metallurgy & Mining","Material Science
Journal title
Journal of alloys and compounds → ACNP
ISSN journal
09258388
Volume
205
Issue
1-2
Year of publication
1994
Pages
59 - 62
Database
ISI
SICI code
0925-8388(1994)205:1-2<59:OOVIAA>2.0.ZU;2-5
Abstract
The vanadium oxidation in atomic and molecular oxygen is investigated in the temperature range 873-1373 K at oxygen pressures of 9 x 10(-3)- 7 x 10(-2) Pa. At the initial stage of oxidation, when the dissolution of oxygen in vanadium takes place, both the diatomic and atomic oxyge n absorption probabilities are independent on the incident flux. The a bsorption probability of atomic oxygen is not much higher than that of diatomic oxygen (approximately three fold). The rate of reaction at t he oxygen dissolution stage is determined by the chemisorption of atom ic or diatomic oxygen on the vanadium surface.