Y. Santiago et Cr. Cabrera, SURFACE-ANALYSIS AND ELECTROCHEMISTRY OF MOS2 THIN-FILMS PREPARED BY INTERCALATION-EXFOLIATION TECHNIQUES, Journal of the Electrochemical Society, 141(3), 1994, pp. 629-635
MoS2 thin films of ca 390 angstrom on a TiO2/Ti substrate, prepared by
an intercalation-exfoliation method, have been characterized by elect
ron spectroscopy for chemical analysis, Rutherford backscattering spec
troscopy, scanning electron microscopy, x-ray fluorescence, and electr
ochemical methods. Scanning electron micrograph analyses indicates the
presence of two surfaces, one composed of basal planes and another of
axial planes. Cyclic voltametry of ferrocene, tetracyanoquinodimethan
e, chloranil, tetramethylphenylenediamine, and decamethylferrocene wit
h MoS2 thin film electrodes without illumination showed linear diffusi
on cyclic voltammetric waves. This is due to the metallic-like behavio
ur of the MoS2 thin film which have a high density of axial planes on
the electrode surface. Under illumination, the cyclic voltammetric wav
es of the redox systems had a sigmoidal shape, characteristic of semic
onducting surfaces. The electrochemical behavior of the MoS2 electrode
, without illumination, is compared to that of an ultramicroelectode (
UME) array. In this case the UME is a MoS2 axial plane site, and it is
within MoS2 basal planes (i.e., semiconducting surfaces).