Defect formation in low-resistivity n-ZnSe single crystals has been st
udied by deep-level transient capacitance spectroscopy. The donor conc
entration in the crystals was N(D) = 2.9 x 10(17) cm-3. The samples we
re, bombarded by an uncollimated beam of a particles from a Po-210 sou
rce (4.5-5.3 MeV) with a flux density of 2 X 10(8) cm-2.s-1. Electron
trapping centers with energies of 0.27 and 0.30 eV, due to thermal def
ects, were found in the original crystals. The bombardment introduces
electron trapping centers with energies of 0.27, 0.30, 0.40, and 0.7-0
.9 eV. It also introduces a series of hole trapping centers with energ
ies of 0.3-0.7 eV. For the electron traps with an energy of 0.30 eV, t
he dose dependence of the concentration is linear with a formation rat
e of 1800 cm-1. The changes caused in the basic properties of Ag-ZnSe
diodes by the bombardment (an increase in the barrier height, a decrea
se in the capacitance, and an increase in the series resistance) resul
t from the formation of a compensated surface layer of the semiconduct
or with a conductivity close to the intrinsic value. This effect is ca
used by the high formation rate of acceptor defects (zinc vacancies an
d complexes containing them) during the bombardment and their compensa
tion by shallow donors.