HIGH DEPTH RESOLUTION RUTHERFORD BACKSCATTERING METHOD FOR ASSESSING HIGH-T(C) STRUCTURES

Citation
Em. Verbitskaya et al., HIGH DEPTH RESOLUTION RUTHERFORD BACKSCATTERING METHOD FOR ASSESSING HIGH-T(C) STRUCTURES, Instruments and experimental techniques, 36(6), 1993, pp. 922-926
Citations number
8
Categorie Soggetti
Instument & Instrumentation",Engineering
ISSN journal
00204412
Volume
36
Issue
6
Year of publication
1993
Part
2
Pages
922 - 926
Database
ISI
SICI code
0020-4412(1993)36:6<922:HDRRBM>2.0.ZU;2-D
Abstract
We consider how to improve the depth resolution of Rutherford backscat tering of ions as applied to the composition analysis of thin high-T(c ) films and structures by optimizing the ion spectrometer. It is shown that the energy resolution can be brought close to the theoretical li mit for He-4+ energies under 2 MeV, the range commonly used by the met hod when using Si-detectors of alpha-particles with energies of congru ent-to 5 MeV. A depth resolution of congruent-to 100 angstrom was obta ined in studies of Yba2cu3o7-delta and Y2BaCuO5 thin films (congruent- to 10(3) angstrom) on MgO substrates. With a tilted ion beam, the reso lution is congruent-to 40 angstrom. Ions with energies up to 8 MeV wer e used for films under 10(4) angstrom thick, which resulted in a resol ution of 3% of the film depth.