Long-term ring-oscillator hot-carrier degradation data and simulation
results are compared to demonstrate that a circuit reliability simulat
or BERT can predict CMOS digital circuit speed degradation from transi
stor dc stress data. We present generalized hot-carrier-reliability de
sign rules that translate device-level degradation rate to CMOS circui
t lifetime. The design rules, which consist of lifetime and speed degr
adation factors, can roughly predict CMOS circuit degradation during t
he initial design, and can help reliability engineers to quickly estim
ate the overall product hot-carrier reliability. The NMOSFET and PMOSF
ET lifetime factors were found to obey 4/ft(rise) and 10/ft(fill) resp
ectively. Typically, the NMOSFET and PMOSFET speed degradation factors
are 1/4 and 1/2, respectively, with saturation region drain current a
s the monitor, while for a 100 MHz operating frequency and for an inpu
t rise time of 0.35 ns, the NMOSFET and PMOSFET time factors are 120 a
nd 300, respectively.