THE EFFECT OF POWER DISCHARGE ON THE ACID-BASE PROPERTIES OF THIN-FILMS DEPOSITED FROM HYDROXYETHYLMETHACRYLATE PLASMA

Citation
M. Morra et al., THE EFFECT OF POWER DISCHARGE ON THE ACID-BASE PROPERTIES OF THIN-FILMS DEPOSITED FROM HYDROXYETHYLMETHACRYLATE PLASMA, Journal of colloid and interface science, 164(2), 1994, pp. 325-332
Citations number
22
Categorie Soggetti
Chemistry Physical
ISSN journal
00219797
Volume
164
Issue
2
Year of publication
1994
Pages
325 - 332
Database
ISI
SICI code
0021-9797(1994)164:2<325:TEOPDO>2.0.ZU;2-X
Abstract
The effect of the power discharge on the surface properties of thin fi lms deposited from hydroxyethylmethacrylate plasma was evaluated by X- ray photoelectron spectroscopy and contact angle measurement. Surface energetics parameters were measured by model acidic or basic test liqu ids and discussed according to the theories of acid-base or electron d onor/electron acceptor interfacial interactions. Results show that the power discharge has a marked effect on the acid-base properties of th e plasma-deposited films and, as a consequence, on the interactions of the latter with the surrounding environment. (C) 1994 Academic Press, Inc.