TEMPERATURE-DEPENDENCE OF KERR ROTATION FOR NI FILM

Authors
Citation
Gq. Di et S. Uchiyama, TEMPERATURE-DEPENDENCE OF KERR ROTATION FOR NI FILM, Journal of applied physics, 75(8), 1994, pp. 4270-4272
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
75
Issue
8
Year of publication
1994
Pages
4270 - 4272
Database
ISI
SICI code
0021-8979(1994)75:8<4270:TOKRFN>2.0.ZU;2-L
Abstract
We measured the temperature dependence of the Kerr rotation spectrum o f a Ni polycrystalline film. We observed an increment of 35% for the p olar Kerr rotation at 3.18 eV when the temperature was decreased from 300 to 84 K. This effect is much larger than the increment of 4% obser ved in the saturation magnetization over the same temperature range. T he experimental data at low-temperature are in excellent agreement wit h published ab initio calculations, whereas the variation of the Kerr rotations with temperature may be attributed to the rearrangement of e lectrons in the 3d bands.