TINX MAGNETRON SPUTTER COATING CONTROLLED BY AN IN-SITU EDDY-CURRENT SENSOR

Authors
KLUMPERWESTKAMP H MAYR P
Citation
H. Klumperwestkamp et P. Mayr, TINX MAGNETRON SPUTTER COATING CONTROLLED BY AN IN-SITU EDDY-CURRENT SENSOR, Thin solid films, 241(1-2), 1994, pp. 30-33
Citations number
13
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
241
Issue
1-2
Year of publication
1994
Pages
30 - 33
Database
ISI
SICI code
0040-6090(1994)241:1-2<30:TMSCCB>2.0.ZU;2-P
Abstract
The quality of magnetron-sputtered TiN(x) coatings can vary significan tly. The reasons for this must be sought in the coating process parame ters and substrate conditions. A sensor developed for controlling in s itu the coating parameters during the coating process should be a good tool for direct quality control and better process regulation. The co nstruction of an eddy current sensor and measurement results will be d iscussed.