H. Klumperwestkamp et P. Mayr, TINX MAGNETRON SPUTTER COATING CONTROLLED BY AN IN-SITU EDDY-CURRENT SENSOR, Thin solid films, 241(1-2), 1994, pp. 30-33
The quality of magnetron-sputtered TiN(x) coatings can vary significan
tly. The reasons for this must be sought in the coating process parame
ters and substrate conditions. A sensor developed for controlling in s
itu the coating parameters during the coating process should be a good
tool for direct quality control and better process regulation. The co
nstruction of an eddy current sensor and measurement results will be d
iscussed.