CHEMICAL-VAPOR-DEPOSITION OF SILICON-CARBIDE ON MESOPHASE PITCH-BASEDCARBON-FIBERS

The paper describes experiments concerning the chemical vapour deposit ion (CVD) of SiC from methyl trichlorosilane (MTS) on commercially ava ilable continuous mesophase pitch-based carbon fibres. The influence o f the reaction parameters (deposition temperature, concentration of th e reactants and composition of the carrier gas) on the kinetics of the deposition of SiC was investigated. The carbon fibres coated with SiC were characterized by their mechanical properties measured in a 30 mm monofilament test, the morphology of the surface of the coated and of the uncoated fibres was investigated by scanning electron microscopy, and the oxidation behaviour is discussed in terms of the weight chang e measured in a thermal balance during heating in air with a constant heating rate.