THE INFLUENCE OF DEPOSITS IN A METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION APPARATUS ON THE STABILITY OF PRECURSORS

Authors
LANG FR DAHMEN KH
Citation
Fr. Lang et Kh. Dahmen, THE INFLUENCE OF DEPOSITS IN A METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION APPARATUS ON THE STABILITY OF PRECURSORS, Thin solid films, 241(1-2), 1994, pp. 378-382
Citations number
16
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
241
Issue
1-2
Year of publication
1994
Pages
378 - 382
Database
ISI
SICI code
0040-6090(1994)241:1-2<378:TIODIA>2.0.ZU;2-F
Abstract
The design and the construction of a pyrolysis mass spectrometer suita ble for monitoring metal-organic chemical vapour deposition reactions is reported. The CeO2-catalysed decompositions of Hacac (where acac de notes acetylacetone), Hdpm (where dpm denotes dipivaloylmethane), Ce(a cac)4 and Ce(dPM)4 were investigated using this apparatus. The tempera ture dependence and the inhibition of the catalytic surface (1000-3000 angstrom of CeO2) were also studied.