At RIKEN we have constructed an electron-beam ion source (EBIS) for us
e with synchrotron radiation to study the photoionization process of h
ighly charged ions. The reason for using an EBIS as an ion target is t
hat it can produce several orders of magnitude higher density ion targ
ets than conventional ion sources in an ultra-high-vacuum environment.
Calculations have shown that ion densities between 10(8) and 10(10) i
ons/cm3, under various operating conditions, are obtainable in an EBIT
. The apparatus will also be used to test the photon beam ion source (
PHOBIS) mode of operation to create low-energy multicharged ions by re
placing the electron beam with synchrotron radiation.