A new electron cyclotron resonance (ECR) ion source has been developed
in the laboratory. The ECR condition at 2.45 GHz is obtained in a mul
ticusp arrangement using a set of four parallelepiped-shaped SmCo magn
ets regularly spaced around a cylindrical ionization chamber 50 mm in
diameter and 50 mm in height. The electromagnetic cavity is made of a
shielded quarter-wavelength Lecher line resonator coaxially coupled to
the microwave generator through an excitation loop antenna and a SMA-
type connector. The extracted argon ion beam current density has been
measured for different excitation modes fixed by the loop antenna orie
ntation. A current density of 1 mA/cm2 has been reached with an incide
nt microwave power of 110 W and a chamber pressure of 9 x 10(-3) mbar.
The small dimensions of this ion source and its performance allow to
use it not only in applications such as ion beam processing and cleani
ng or surface treatments in advanced microelectronics, but also as a n
eutralizer for ion deposition applications.