A SMALL UNBALANCED MAGNETRON SPUTTERING SOURCE WITH MULTIPOLE MAGNETIC-FIELD ANODE

A study of a small unbalanced magnetron source with a multipole cusp m agnetic field anode is described. The coaxial magnetron principle was extended to the small unbalanced planar magnetron source. In the radia l arrangement of magnets, the S pole of the magnet is directed toward the center of the permanent magnet annulus, and the core of the magnet ized mild steel was only 5 mm in diameter. Such a construction of the unbalanced magnet arrangement makes the magnetron sputtering target as small as 34 mm in diameter, and increases the sputtering area of the target to 60%. The multipole magnetic field put in the anode can make the unbalanced magnetron source run in a higher discharge current at a lower arc voltage condition after beginning the arc discharge at a hi gher beginning arc voltage.