CHARACTERISTICS OF HALL-EFFECT PLASMA-ACCELERATOR FOR INDUSTRIAL APPLICATION

For thin film fabrication and surface modification, ion sources with h igh current, low energy, and broad beam are required. The source shoul d be simple and reliable to operate, mechanically rugged, and highly p roductive for commercial use. To meet these requirements, a Hall effec t plasma accelerator has been manufactured and tested. A beam energy o f 200-300 eV and a beam current density of up to 10 mA/cm2 have been o btained with the source. Operational characteristics and possibility f or industrial application are presented.