HELICON ION-SOURCE FOR PLASMA PROCESSING

The results of theoretical and experimental investigations of dense pl asma source resonantly excited by helicon wave are presented. Driven b y a single-loop low-voltage (congruent-to 300 V) antenna, a source gen erates a plasma of density up to 5 X 10(11) cm-3 at gas pressures 0.5- 20 mTorr, operates at magnetic, fields < 100 Gs, and produces low-ener gy ion fluxes (< 60 eV) with current densities up to 7 mA/cm2 and 3.5% nonuniformity within a diameter 10 cm. A high-efficiency helicon sour ce originates in a special kind of ''resonance'' wave discharge, where a sharp increase of plasma resistance occurs near the helicon wave di spersion branches.