LOW-ENERGY BROAD-BEAM MULTIPOLE ION-SOURCE

Authors
LU DL YANG JF JIANG SF
Citation
Dl. Lu et al., LOW-ENERGY BROAD-BEAM MULTIPOLE ION-SOURCE, Review of scientific instruments, 65(4), 1994, pp. 1371-1373
Citations number
4
Categorie Soggetti
Physics, Applied","Instument & Instrumentation
Journal title
Review of scientific instruments → ACNP
ISSN journal
00346748
Volume
65
Issue
4
Year of publication
1994
Part
2
Pages
1371 - 1373
Database
ISI
SICI code
0034-6748(1994)65:4<1371:LBMI>2.0.ZU;2-K
Abstract
A low energy broad beam multipole ion source has been successfully dev eloped at the Southwestem Institute of Physics, which can be used for both sputtering deposition and direct ion beam deposition. The extract ed A(r)+ beam current is 30-250 mA at a beam energy of 200-6000 eV. It has been used for sputtering deposition at the three beam synchronous ly mixing machine in Dalian University of Technology.