UNIFORMITY IMPROVEMENT OF OPTICAL AND ELECTRICAL CHARACTERISTICS IN INTEGRATED VERTICAL-TO-SURFACE TRANSMISSION ELECTROPHOTONIC DEVICE WITHA VERTICAL-CAVITY
K. Kurihara et al., UNIFORMITY IMPROVEMENT OF OPTICAL AND ELECTRICAL CHARACTERISTICS IN INTEGRATED VERTICAL-TO-SURFACE TRANSMISSION ELECTROPHOTONIC DEVICE WITHA VERTICAL-CAVITY, JPN J A P 1, 33(3A), 1994, pp. 1352-1356
We report an improvement in uniformity of both electrical and optical
characteristics in an integrated vertical-to-surface transmission elec
tro-photonic device with a vertical cavity. This improvement is due to
both highly controlled reactive ion-beam etching and a self-alignment
process. Reactive ion-beam etching highly controls etching depth, and
leads to uniform electrical and optical characteristics. Self-alignme
nt process makes it possible to fabricate a fine pattern with high acc
uracy. By using these fabrication processes, the deviations of both th
e electrical resistance and the. optical light-output characteristics
are reduced to less than half of those for the wet-etched devices. Fur
thermore, the remaining deviation in the light-output characteristics
is reduced by suppressing light reflection on the surface. As a result
, the standard deviation of the threshold current under the CW conditi
on is 0.39 mA. This value is about half of that for the wet-etched dev
ices.