OPTICAL-EMISSION SPECTROSCOPIC STUDIES ON THE GROWTH OF YBCO THIN-FILMS BY DC-94.92 MHZ HYBRID PLASMA SPUTTERING

Optical emission spectroscopic studies of dc-94.92 MHz hybrid plasma g enerated in the newly developed magnetron sputtering system were perfo rmed during the growth of YBa2Cu3O7-delta (YBCO) thin films. All the d etectable species showed uniform spatial distribution along the radial direction of the target more than 8 mm above the target surface. High cathode current conditions in the hybrid plasma were found to make th e plasma with high ion density. The high ionizing efficiency was concl uded to be essential in obtaining an excellent crystalline film. This result is explained by the ion acceleration mechanism through the ion sheath formed near the substrate surface. Oxygen gas introduced into t he growing chamber during deposition was found to be responsible for t he oxidation of the target surface.