K-band electron spin resonance and high-frequency capacitance-voltage
measurements have been combined to analyze the charge state of the int
rinsic delocalized EX defect naturally generated in thermal SiO2 on (1
11) and (001) Si. The data provide strong evidence for the positive ch
arge state of the defect when electron spin resonance active (paramagn
etic): the EX centers account, within a factor of 2, for all detected
positive charge in the Si-dioxide films. Passivation of the EX defects
into a diamagnetic state through hydrogenation is found to go hand in
hand with the charge neutralization of the centers.