TEMPERATURE-DEPENDENT MCXD MEASUREMENTS OF THIN NI FILMS ON CU(100)

We present soft X-ray magnetic circular X-ray dichroism (MCXD) measure ments at the Ni L edges of thin Ni films on Cu(100) with a thickness b etween 1 and 7 monolayers. The data were measured around the L3 edge c overing the whole temperature range up to the critical temperature. Fu rthermore, measurements around both the L3 and L2 edges were performed at low temperatures. The temperature variation of the MCXD signal and the critical temperatures of the films as a function of their thickne ss are discussed and compared to results of other studies.