THE INTERACTION OF CHLORINE WITH SI(100)2X1 STUDIED USING SOFT-X-RAY PHOTOEMISSION AND PHOTON-STIMULATED ION DESORPTION

Authors
STERRATT D GREENWOOD CL WILLIAMS EM MURYN CA WINCOTT PL THORNTON G ROMAN E
Citation
D. Sterratt et al., THE INTERACTION OF CHLORINE WITH SI(100)2X1 STUDIED USING SOFT-X-RAY PHOTOEMISSION AND PHOTON-STIMULATED ION DESORPTION, Surface science, 309, 1994, pp. 269-273
Citations number
21
Categorie Soggetti
Chemistry Physical
Journal title
Surface science → ACNP
ISSN journal
00396028
Volume
309
Year of publication
1994
Part
A
Pages
269 - 273
Database
ISI
SICI code
0039-6028(1994)309:<269:TIOCWS>2.0.ZU;2-Z
Abstract
Chlorine adsorption on Si(100)2 x 1 at 295 K and 473 +/- 50 K has been investigated using Si 2p soft X-ray photoemission and photon stimulat ed ion desorption (PSID) at the SiL2,3 edge. The photoemission results indicate that both monochloride and dichloride species are formed, wi th a ratio of approximately 2.5:1. Essentially identical results are o btained if the sample is exposed to chlorine from either an electroche mical cell or a gas bottle. The PSID yield of Cl+ ions at the SiL2,3 e dge is dominated by X-ray-induced electron stimulated desorption (XESD ).