SURFACE-MORPHOLOGY AFTER LOW-COVERAGE PT DEPOSITION ON CU(110)

The morphology of a Cu(110) surface after low coverage Pt atom deposit ion from the vapour phase is studied with thermal energy atom scatteri ng (TEAS) in the temperature range of 200-800 K. Both cross section me asurements and diffraction analysis reveal different structures. At lo w temperatures, isolated defects containing a metal adatom are observe d. Between 350 and 650 K, experimental results suggest that these aggr egates are dissociated, leaving behind them an almost flat surface pat ch with an incorporated Pt atom. Above 650 K, bulk dissolution of Pt o ccurs.