Epitaxial layers of GaAs grown by Metal Organic Vapor Phase Epitaxy on
InP (111) A and B polar substrates have been investigated by Raman sc
attering. The tensile strain, mainly due to the lattice mismatch betwe
en GaAs and InP, has been evidenced by the red shifts of both the TO a
nd LO GaAs phonons. From these shifts approximate values of the parall
el strain have been obtained using phonon deformation potential parame
ters. With identical growth conditions and times, larger growth rates
are found for A than for B samples.