FILM MODEL FOR SULFUR-DIOXIDE ABSORPTION INTO QUIESCENT WATER WITH INTERFACIAL RESISTANCE

A film model for sulfur dioxide absorption into quiescent water with a n equilibrium chemical reaction, taking into consideration the effect of the interfacial resistance, is presented. A closed-form solution ha s been obtained. The results indicate that the interfacial resistance significantly reduces the absorption rate. For a sensitivity analysis, an equilibrium chemical reaction with a higher value of equilibrium r ate constant would result in a greater reduction of the absorption rat e. The effect of the interfacial resistance dominates in the region wi th the small values of 4 D(A)/pik(L)2. This analysis could be of impor tance for the SO2 removal in the situations where impurities contamina te the gas-liquid interface inducing an interfacial resistance effect. Also, the film model avoids the time dependence and thus is much easi er to apply than the penetration model. The present results of the fil m model are in satisfactory agreement with the experimental data. For the special case with no interfacial resistance effect, the present so lution reduces to a previous work of other investigators.