ELECTRON-BEAM DEPOSITION SYSTEM FOR X-RAY MULTILAYER MIRRORS

Authors
LODHA GS NANDEDKAR RV VARMA A
Citation
Gs. Lodha et al., ELECTRON-BEAM DEPOSITION SYSTEM FOR X-RAY MULTILAYER MIRRORS, Bulletin of Materials Science, 19(6), 1996, pp. 1109-1116
Citations number
16
Categorie Soggetti
Material Science
Journal title
Bulletin of Materials Science → ACNP
ISSN journal
02504707
Volume
19
Issue
6
Year of publication
1996
Pages
1109 - 1116
Database
ISI
SICI code
0250-4707(1996)19:6<1109:EDSFXM>2.0.ZU;2-4
Abstract
We have developed a multi source electron beam evaporation system to p repare high quality X-ray multilayer mirrors. The system has three ele ctron guns mounted in an ultra high vacuum chamber. The deposition sys tem is evacuated by a turbo molecular pump and two sputter ion pumps. A movable masking system is mounted to deposit several kinds of multil ayers. First results on niobium-carbon X-ray multilayers are presented .