We find that the incorporation of As and P into GaAs1-yPy, when using
gas-source molecular beam epitaxy, does not depend linearly upon the a
tomic fluxes within the reactor. Rather, incorporation of As and P int
o GaAsP goes as the square of the atomic fluxes, i.e., y = f(P)2/(f(P)
2 + betaf(As)2), where F(P(As)) is the flux of P(As). Beta is a fittin
g parameter and that differs for relaxed and strained GaAsP. The devia
tion in y from a linear model [y = f(P)/(f(P) + f(As))] is as high as
a factor of two, whereas our quadratic model is never more than a few
percent off. We interpret this as due to surface pairing between two l
ike species (dimerization) in order for them to incorporate into the c
rystal.