EFFECT OF POLYMER ACCELERATORS UPON DEVELOPMENT-FREE VAPOR PHOTOLITHOGRAPHY

Development-free vapor photolithography (DFVP) is a new technology, wh ich is based on the reaction of SiO2 with HF vapor under a polymer fil m in the presence of accelerators. This paper discusses the effect of functional groups of polymers, glass transition temperature (T(g)), fi lm thickness, and etching temperature on the reaction. The results dem onstrate that polymers with carbonyl, nitro, amino, amino formacyl, an d other polar functional groups act not only as film formers but also as accelerators of the etching reaction of SiO2 with HF.