HIGH-EFFICIENCY INGAAS GAAS SINGLE-QUANTUM-WELL LASERS USING SINGLE-STEP METALORGANIC CHEMICAL-VAPOR-DEPOSITION/

Citation
Hm. Zhao et al., HIGH-EFFICIENCY INGAAS GAAS SINGLE-QUANTUM-WELL LASERS USING SINGLE-STEP METALORGANIC CHEMICAL-VAPOR-DEPOSITION/, IEEE photonics technology letters, 6(4), 1994, pp. 468-470
Citations number
7
Categorie Soggetti
Optics,"Physics, Applied
ISSN journal
10411135
Volume
6
Issue
4
Year of publication
1994
Pages
468 - 470
Database
ISI
SICI code
1041-1135(1994)6:4<468:HIGSLU>2.0.ZU;2-Y
Abstract
Low-threshold-current single-quantum-well InGaAs/GaAs lasers are fabri cated by metalorganic chemical vapor deposition on a nonplanar substra te. By taking advantage of the growth rate and doping differences on d ifferent crystal facets during the growth, a buried heterostructure la ser with natural current blocking p-n-p-n junction is formed by a sing le growth step. Threshold currents as low as 1.0 mA under pulsed opera tion and 1.2 mA under continuous-wave operation are obtained for uncoa ted lasers at room-temperature. The lasers showed high external quantu m efficiency (80%) and high T0 (150 K). High reflection coated laser ( 95%/95%) have CW threshold current as low as 0.28 mA.