M. Kittler et al., RECOMBINATION ACTIVITY OF CLEAN AND CONTAMINATED MISFIT DISLOCATIONS IN SI(GE) STRUCTURES, Materials science & engineering. B, Solid-state materials for advanced technology, 24(1-3), 1994, pp. 52-55
The recombination at misfit dislocations in Si(Ge) structures was stud
ied by the technique of electron-beam-induced current. The contrast te
mperature dependence was interpreted using the Schokley-Read-Hall reco
mbination theory. Different situations were observed: either a dominan
ce of shallow centres (intrinsic property) or of midgap levels (contam
ination), or a combination of both. D-band luminescence studies suppor
t the role of contamination. The very small recombination at dislocati
ons in as-grown material was interpreted as a passivation of the intri
nsic activity.