PHOTOTHERMAL SCANNING NEAR-FIELD MICROSCOPY

Citation
M. Stopka et al., PHOTOTHERMAL SCANNING NEAR-FIELD MICROSCOPY, Materials science & engineering. B, Solid-state materials for advanced technology, 24(1-3), 1994, pp. 226-228
Citations number
6
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
24
Issue
1-3
Year of publication
1994
Pages
226 - 228
Database
ISI
SICI code
0921-5107(1994)24:1-3<226:PSNM>2.0.ZU;2-Y
Abstract
Two types of photothermal measurement technique will be presented, whi ch might allow the high spatially resolved investigation of thermal pr operties of substrates and thin films. Both methods employ measurement techniques which are based on scanning near-field microscopy. In the first case we show initial experimental results of periodic thermal ex pansion measurements of a laser excited sample surface using a scannin g tunneling microscope. In the second case we present the principle of a scanning thermal microscope, which measures the temperature distrib ution above the sample surface.