The surface scientist has a wide range of sophisticated techniques ava
ilable to study the state of surfaces and molecules adsorbed thereon.
On single crystals the surface geometry and structural and electronic
state of the surface and simple adsorbates can be probed precisely. On
less ideal surfaces, many of the techniques are very difficult to app
ly. Amongst the armoury of surface science techniques, only two have p
roduced significant fruit in the study of chemically complex materials
: X-ray photoelectron spectroscopy (XPS) and static secondary ion mass
spectrometry (SSIMS). Although XPS has been, and continues to be, ver
y important as the most widely used method of surface analysis, in man
y applications of current interest SSIMS is proving to have tremendous
potential and could develop into the technique of choice for a vast r
ange of problems. Chief amongst its strengths is its emerging ability
to provide chemical structure data in the form of the cluster or polya
tomic ions which are observed. The emergence of SSIMS as a true surfac
e mass spectrometric technique for the analysis of complex materials i
s reviewed and the following aspects are demonstrated: SSIMS is basica
lly a soft ionization technique where the spectra are related to the s
urface chemical structure; organic and other insulating materials can
be analysed easily; and time-of-flight analysers ace the analysers of
choice for most SSIMS analyses.