APPLICATIONS OF INTENSE PULSED ION-BEAM TO MATERIALS SCIENCE

Citation
K. Yatsui et al., APPLICATIONS OF INTENSE PULSED ION-BEAM TO MATERIALS SCIENCE, Physics of plasmas, 1(5), 1994, pp. 1730-1737
Citations number
18
Categorie Soggetti
Phsycs, Fluid & Plasmas
Journal title
ISSN journal
1070664X
Volume
1
Issue
5
Year of publication
1994
Part
2
Pages
1730 - 1737
Database
ISI
SICI code
1070-664X(1994)1:5<1730:AOIPIT>2.0.ZU;2-P
Abstract
In addition to being initially developed as an energy driver for an in ertial confinement fusion, an intense, pulsed, light-ion beam (LIB) ha s been found to be applied to materials science. If a LIB is used to i rradiate targets, a high-density ''ablation'' plasma is produced near the surface since the range of the LIB in materials is very short. Sin ce the first demonstration of quick preparation of thin films of ZnS b y an intense, pulsed, ion-beam evaporation (IBE) using the LIB-produce d ablation plasma, various thin films have been successfully prepared, such as of ZnS:Mn, YBaCuO, BaTiO3, cubic BN, SiC, ZrO2, ITO, B, C, an d apatite. Some of these data will be presented in this paper, with it s analytic solution derived from a one-dimensional, hydrodynamic, adia batic expansion model for the IBE. The temperature will be deduced usi ng ion-flux signals measured by a biased ion collector. Reasonable agr eement is obtained between the experiment and the simulation. High-ene rgy LIB implantation to make chemical compounds and the associated sur face modification are also discussed.