We demonstrate a new method for imaging vertical and near vertical sur
face features by atomic force microscopy (AFM). It is based on an attr
active force mode AFM, equipped with a special boot-shaped tip, couple
d with a measurement of slope and with a special tracking technique. S
urface profiling is achieved through a novel servo and scanning system
. Mapping sidewall profile opens the door to measurement of critical d
imensions (width and wall angles) of lines and trenches in integrated
circuits, with high accuracy.