ELECTRODE FILMING IN THE ELECTRODEPOSITION OF DIFFICULT-TO-PLATE REFRACTORY-METALS

Citation
Tc. Franklin et al., ELECTRODE FILMING IN THE ELECTRODEPOSITION OF DIFFICULT-TO-PLATE REFRACTORY-METALS, Plating and surface finishing, 81(5), 1994, pp. 102-105
Citations number
15
Categorie Soggetti
Metallurgy & Mining","Materials Science, Coatings & Films
ISSN journal
03603164
Volume
81
Issue
5
Year of publication
1994
Pages
102 - 105
Database
ISI
SICI code
0360-3164(1994)81:5<102:EFITEO>2.0.ZU;2-J
Abstract
As part of AESF Research Project 80, it was demonstrated that titanium could be electrodeposited from aqueous pastes of insoluble titanium c ompounds. It was also demonstrated that, using the concept of precipit ation of an insoluble titanium compound on the cathode during reductio n, titanium could be electrodeposited from aqueous solutions. The depo sits, however, were generally thin, dark, powdery, nonadherent, and of ten amorphous. It was demonstrated as well that electroreduction of aq ueous vanadium pentoxide pastes on nickel electrodes produced nickel-v anadium alloys. Reduction of aqueous tungstic acid pastes, however, pr oduced only a film of W20O58, indicating that the reaction is primaril y dehydration and polymerization, and that only a small amount of redu ction occurred.