Cc. Streinz et al., A MICROELLIPSOMETRIC STUDY OF THE PASSIVE FILM FORMATION ON AL-TA ALLOYS .2. THE ROLE OF AL3TA PRECIPITATES IN BREAKDOWN, Journal of the Electrochemical Society, 141(5), 1994, pp. 1132-1137
Al3Ta precipitates act as sites for pit initiation and propagation in
Al-Ta alloys. Dynamic imaging microellipsometry was used to measure th
e change in oxide film thickness and the refractive indexes of the fil
ms that form on the precipitates and matrix to examine the role of the
precipitates in breakdown. Film formation was measured on an Al-1.5 a
/o Ta alloy, containing Al3Ta precipitates approximately 50 mum in dia
meter at applied potentials of 0.0, 1.0, 2.0, and 5.0 V SCE in a pH 7.
2 borate buffer solution. At 0.0 V SCE the change in passive film thic
kness on the precipitate was greater than that on the Al matrix. The c
hanges in film thicknesses at 1.0 V SCE were approximately equal and a
t higher potentials (2.0 and 5.0 V SCE) the matrix film thickened more
than the film on the precipitate. SEM observations demonstrate that t
he precipitate-matrix interface is highly susceptible to localized att
ack when the passive film on the Al3Ta is thicker than on the matrix (
at 0.0 V SCE). We propose that pit initiation occurs at both the inter
face of the Al3Ta precipitation and in the dealloyed region around its
periphery.