PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF VANADIUM CARBIDE VC1-X AND VOX FROM VANADOCENE CP2V

Authors
DEUTSCHMANN L MESSELHAUSER J SUHR H HERRMANN WA HARTER P
Citation
L. Deutschmann et al., PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF VANADIUM CARBIDE VC1-X AND VOX FROM VANADOCENE CP2V, Advanced materials, 6(5), 1994, pp. 392-395
Citations number
34
Categorie Soggetti
Material Science
Journal title
Advanced materials → ACNP
ISSN journal
09359648
Volume
6
Issue
5
Year of publication
1994
Pages
392 - 395
Database
ISI
SICI code
0935-9648(1994)6:5<392:PCOVCV>2.0.ZU;2-R
Abstract
Plasma enhanced CVD of vanadium carbide and oxides is reported for the first time. Vanadium carbide and vanadium oxides are of technological interest for hard coatings (VC1-x), storage media (VO2), and smart el ectrochromic windows (V2O5), and until now have been prepared mainly b y physical deposition methods. The advantages of the precursor vanadoc ene are outlined and the influence of experimental parameters such as the hydrogen flow rate and the substrate temperature on the compositio n and resistivity of the films described.