Y. Tanaka et al., THE OPENING PROCESS OF THERMAL PLASMA CONTACTS IN A POST-ARC CHANNEL AFTER CURRENT ZERO IN A FLAT-TYPE SF6 GAS-BLAST QUENCHING CHAMBER, Journal of physics. D, Applied physics, 30(3), 1997, pp. 407-416
The electrical resistivity rho(res) of a post-are channel after curren
t zero was measured along the nozzle axis in a flat-type SF6 gas-blast
quenching chamber. In the chamber, iron electrodes were intentionally
adopted, since Fe spectral lines at wavelengths of 426 and 443 nm hav
e much higher radiation intensities than those of S+, F or Cu at tempe
ratures below 5000 K. Observation of the two Fe spectral lines permitt
ed determination of temperature T and iron vapour concentration X(Fe)
in the post-are channel up to 100 mu s after current zero, On the othe
r hand, rho(res) of SF6 gas contaminated with iron vapour was theoreti
cally calculated on the basis of the simplified first Chapman-Enskog a
pproximation, Use of this calculation result made it possible to estim
ate rho(res) Of the post-are channel from the measured T and X(Fe). Th
e estimation result revealed that rho(res) increased more dramatically
at the nozzle throat than at other axial locations, reaching 4.3 Omeg
a m at 100 mu s after current zero, Furthermore, on the basis of the a
xial distribution of rho(res), the concept of 'thermal plasma contacts
' was developed to interpret behaviour of the post-are channel.