GROWTH OF 2H-SIC ON 6H-SIC BY PULSED-LASER ABLATION

Citation
Ma. Stan et al., GROWTH OF 2H-SIC ON 6H-SIC BY PULSED-LASER ABLATION, Applied physics letters, 64(20), 1994, pp. 2667-2669
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
64
Issue
20
Year of publication
1994
Pages
2667 - 2669
Database
ISI
SICI code
0003-6951(1994)64:20<2667:GO2O6B>2.0.ZU;2-X
Abstract
A 2H-SiC thin film has been grown on a 6H-SiC substrate by laser ablat ion using an excimer laser. The deposition of 2H-SiC film occurred in a high vacuum system (almost-equal-to 10(-6) Torr) with the substrate temperature near 1200-degrees-C. Plan-view and cross-sectional transmi ssion electron microscopy (TEM) were used to measure the lattice param eters and to identify the polytype. Cross-sectional TEM images clearly show the symmetry of the film as c-axis oriented 2H-SiC containing co lumnar grains with an average diameter of 20 nm and a length of 100 nm .