Nh. Nickel et al., HYDROGEN-INDUCED METASTABLE CHANGES IN THE ELECTRICAL-CONDUCTIVITY OFPOLYCRYSTALLINE SILICON, Physical review letters, 72(21), 1994, pp. 3393-3396
Measurements of the dark electrical conductiVitY sigma(D) performed on
hydrogenated polycrystalline silicon (poly-Si:H) reveal a cooling-rat
e dependent metastable increase of sigma(D) below 268 K. This nonequil
ibrium state relaxes slowly and the time to reach equilibrium is therm
ally activated with E(tau) congruent-to 0.74 eV. Since thermal quenchi
ng does not affect unhydrogenated specimens, the observed metastable c
hanges are clearly due to the formation and dissociation of an electri
cally active hydrogen complex. We propose that this complex consists o
f an isolated H atom at the bond-center site of a prestrained Si-Si bo
nd at a grain boundary.