Photoluminescence (PL) and photoreflectance (PR) measurements on a nom
inally undoped GaAs layer grown by molecular beam epitaxy have been ca
rried out to investigate the neutralization of the carbons and the var
iation of the charges in the GaAs. After the GaAs was hydrogenated and
annealed at 400-degrees-C, PL measurements showed that the relative i
ntensity ratio between the donor-bound exciton and the carbon acceptor
increased by a factor of 2. PR measurements indicate that the variati
on of the broadening parameter is induced by a neutralization of the c
arbon acceptors. These results were caused by the neutralization of th
e carbon due to the combination of the hydrogenic ions and the carbon
ions in the GaAs or by the separation of the hydrogen atoms resulting
from the thermal treatment.