T. Urano et al., LASER FLASH-PHOTOLYSIS IN HIGH-SPEED PHOTOPOLYMER COATING LAYERS, Bulletin of the Chemical Society of Japan, 67(4), 1994, pp. 1074-1077
Sensitization mechanisms of two systems of (dialkylamino)styryl-type d
yes with a radical-generating reagent, 2-[p-(diethylamino)styryl]-, an
d 2-[2-(9-julolidinyl)vinyl]naphtho[1,2-d]thiazole with ',4,4'-tetraki
s(t-butyldioxycarbonyl)benxophenone, in poly(methyl methacrylate) film
have been investigated by laser flash photolysis using a total reflec
tion cell.