DAMAGE DISTRIBUTIONS IN LINBO3 CRYSTAL-INDUCED BY MEV F+ TILTED IMPLANTATIONS

X-cut LiNbO3 crystals have been implanted by 0.8, 1.0 and 1.2 MeV F+ t ilted at angles of 15-degrees, 45-degrees and 60-degrees with doses of 5 x 10(14), 7 x 10(14) and 5 x 10(14) ions/cm2, respectively. The Rut herford backscattering (RBS)/channeling technique was used to investig ate the induced damage distributions. The damage profiles were deconvo luted from the measured spectra after considering the energy spread du e to the different stopping power of channeled and nonchanneled ions. Good agreements were obtained between the measured damage profiles and the calculated defect profiles by TRIM'90 (transport of ions in matte r, version 1990), except that the measured damage concentration was en hanced in the near-surface region. Information on the lateral and long itudinal damage spread in LiNbO3 crystals was obtained from the damage profiles induced by tilted ion implantations and compared with TRIM'9 0 calculation.