Vj. Ghosh et al., AN AB-INITIO MONTE-CARLO STUDY OF LOW-ENERGY POSITRON AND ELECTRON IMPLANTATION IN ELEMENTAL METALS AND MULTILAYERS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 90(1-4), 1994, pp. 442-445
A Monte Carlo code developed at Brookhaven to study positron and elect
ron implantation in solids will be discussed. This code models the tra
jectories of a large number of positrons or electrons as they move thr
ough the material and uses this information to calculate stopping prof
iles, backscattered fractions and transmitted fractions. The particle-
atom interactions are incorporated via elastic and inelastic scatterin
g cross-sections. The incident particle energies vary from 1 to 10 keV
and the simulation stops when the particle energy goes down to 25 eV
or if the particle is backscattered. Main results of our Monte Carlo s
imulations of the mean implantation depth and implantation profiles fo
r both semi-infinite metallic elements and multilayers will be discuss
ed.