Native oxide technology is used to fabricate long wavelength (lambda a
pproximately 1.3 mum) InAlAs-InP-InGaAsP quantum well heterostructure
laser diodes with a buried oxide undercutting and constricting the rid
ge-waveguide active region. The buried native oxide of InAlAs constric
ts the current and reduces edge and surface losses. Data are presented
showing threshold currents as low as approximately 140 mA for approxi
mately 13-mum-wide stripes (L approximately 750 mum), with maximum con
tinuous wave output powers as high as approximately 225 mW/facet and e
xternal differential quantum efficiencies up to 67% (300 K, uncoated f
acets).