ATOMIC DESORPTION OF CHLORINE ADSORBED ON SI(111) WITH A SCANNING TUNNELING MICROSCOPE
Citation
M. Baba et S. Matsui, ATOMIC DESORPTION OF CHLORINE ADSORBED ON SI(111) WITH A SCANNING TUNNELING MICROSCOPE, Applied physics letters, 64(21), 1994, pp. 2852-2854
Categorie Soggetti
Physics, Applied
SICI code
0003-6951(1994)64:21<2852:ADOCAO>2.0.ZU;2-9
Abstract
This letter reports the selective atomic desorption of Cl atoms adsorb
ed on an Si(111)7 X 7 surface by field evaporation using a scanning tu
nneling microscope (STM). After using STM to study the reaction of the
Cl on the surface, the STM tip is placed on the adsorbed Cl and pulse
voltage is applied. This results in selective atomic desorption of Cl
. Although both desorption and readsorption are observed at a low puls
e voltage of +4 - +6 V, only desorption occurs at a high pulse voltage
over +6 V
