HIGH-RESOLUTION ELECTRON-MICROSCOPY OF TH ERMAL EPSILON-MARTENSITE INAN FE-MN-SI-CR-NI SHAPE-MEMORY ALLOY

Citation
Jl. Putaux et al., HIGH-RESOLUTION ELECTRON-MICROSCOPY OF TH ERMAL EPSILON-MARTENSITE INAN FE-MN-SI-CR-NI SHAPE-MEMORY ALLOY, Journal de physique. IV, 4(C3), 1994, pp. 175-180
Citations number
18
Categorie Soggetti
Physics
Journal title
ISSN journal
11554339
Volume
4
Issue
C3
Year of publication
1994
Pages
175 - 180
Database
ISI
SICI code
1155-4339(1994)4:C3<175:HEOTEE>2.0.ZU;2-N
Abstract
Polycrystalline samples of the Fe-Mn-Si-Cr-Ni shape memory alloy which contained a 70% fraction of thermal epsilon-martensite, have been stu died by H.R.E.M. Images taken along a [011]gamma//[2110]epsilon axis c learly show, at the atomic level, the layered substructure of the epsi lon-phase. The structure of the epsilon(h.c.p.)/gamma(f.c.c.) interfac e has been analysed from numerically processed images of elementary ep silon-laminate ends. It can be described by a periodic array of 30-deg rees and 90-degrees Shockley partials in a 2:1 ratio. Isotropic elasti city calculations confirmed this model which illustrates the self-acco mmodation properties of thermal epsilon-martensite at the finest scale .